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Changing the World through Creative Research

Research Infra

SAIT is equipped with world class R&D infrastructures such as Supercomputer, electron-beam lithography (EBL) system, ultra low temperature scanning probe microscopy (ULT-SPM) facility, Aberration-Corrected Transmission Electron Microscopy (TEM), femto-second laser spectroscopy, 
in-situ microsocpy/spectroscopy, nano fab, etc. to conduct research by performing modeling, simulation, experiment, and nanoscaleanalysis.

  • Screen image of one researcher looking at computer screen
  • Images that symbolize science and technology
  • Image of factory front view through automation equipment
  • Image of factory front view through automation equipment
  • Screen image of two researchers working in a dust-proof garment
  • Aberration-Corrected Transmission Electron Microscopy (TEM)

    Analytical equipment enabling atomic scale imaging and spectroscopy using double-aberration-corrector and monochromator

  • Supercomputer

    High performance computing system for CAE and artificial intelligence research

  • In-situ microscopy/spectroscopy

    Analytical methodology wherein the microscopic/spectroscopic
     characterization of materials is coupled simultaneously with the state of device under operation

  • E-beam lithography

    E-beam lithography enabling sub 10 nano patterning

  • 8" Nano Fab

    Versatile R&D fab enabling Si and Non-Si processes